Samsung and ASML Expand Strategic Collaboration for Next-Generation Semiconductor Manufacturing

Samsung Electronics and ASML have announced an expanded strategic partnership to deepen collaboration on High NA EUV lithography and advanced semiconductor manufacturing. Samsung will join an industry initiative for 12-inch photomask technology and plans to adopt ASML's High NA EUV for future DRAM high-volume manufacturing by 2028, marking an industry first. This collaboration aims to accelerate the development and deployment of technologies crucial for the AI era, increasing fab productivity and lowering chipmaking costs.