Intel Foundry and ASML Collaborate to Accelerate Industry Readiness for High Numerical Aperture (High NA) EUV Lithography

Intel Foundry and ASML have announced significant progress in bringing High NA Extreme Ultraviolet (EUV) lithography into production, with over one million wafers processed to date. This collaboration is advancing the technologies for future adoption, including solutions for using current mask formats and championing larger mask format initiatives to support future High NA scaling.