Canon launches FPA-6400ES6a KrF semiconductor lithography system with high throughput and industry-leading overlay accuracy

Canon has announced the FPA-6400ES6a, a new KrF scanner for semiconductor manufacturing, set to launch in early December 2026. This system boasts a throughput of 400 wafers per hour and an industry-leading overlay accuracy of 4.0 nm, addressing the growing demand for advanced semiconductors driven by generative AI. It features a new ultra-high-acceleration stage and vibration-suppression technology to boost productivity and improve yield.